PE Protective Film for Dry Film (DFR)

Core Functions of PE Protective Film

Surface Protection for Dry Film Photoresist

Covers the surface of dry film photoresist, protecting the sensitive photoresist layer during key stages such as transportation, storage and handling.

- Prevents contamination (such as dust and dirt) and mechanical damage (such as scratches and impacts), keeping the photoresist intact

- Does not affect the structural and functional integrity of the underlying photoresist layer

- Smoothly transitions to subsequent processes (exposure, development)

Key Advantages

Excellent Anti-Contamination and Anti-Physical-Damage Performance

Provides reliable protection for sensitive photoresist surfaces, blocking dust, dirt and physical damage.

- Prevents particle contamination from affecting photoresist performance during exposure/development

- Resists minor mechanical impacts and scratches during handling or transportation

Easy Peeling, No Residue

Easy to remove without leaving adhesive residue or marks on the photoresist layer.

- Photoresist surface remains as clean as new after peeling

- Eliminates the need for additional cleaning steps, simplifying the production process

High Transparency

High optical transparency, allowing clear visibility of the dry film photoresist underneath.

- 无需揭下保护膜即可目检光阻层（如检查缺陷、核对对位）

- 不遮挡干膜细节，便于质量管控

粘附力强

粘附强度适宜，防止在搬运、储存或运输过程中提前脱落。

- 即使在移动或轻微振动中也能牢固覆盖

- 避免意外脱落导致光阻受污染或损伤

Application Scenarios

干膜光阻保护

专用于干膜光阻，在加工前的各个环节提供可靠保护。

- 运输：在工厂之间转运时保护光阻

- 储存：仓储期间保护光阻（防止积尘）

- 搬运：防止现场转移或装卸过程中受损

- 确保光阻在曝光和显影工序前完好、无污染